Etching characteristics of a silicon surface induced by focused ion beam irradiation

Author： Kawasegi Noritaka   Morita Noboru   Yamada Shigeru   Takano Noboru   Oyama Tatsuo   Ashida Kiwamu   Taniguchi Jun   Miyamoto Iwao   Momota Sadao  

Publisher： Inderscience Publishers

ISSN： 1368-2148

Source： International Journal of Manufacturing Technology and Management, Vol.9, Iss.1-2, 2006-06, pp. : 34-50

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