Plasma etching of poly-Si/SiO2/Si structures: Langmuir-probe and optical-emission-spectroscopy monitoring

Author： Rudenko K.   Myakon’kikh A.   Orlikovsky A.  

Publisher： MAIK Nauka/Interperiodica

ISSN： 1063-7397

Source： Russian Microelectronics, Vol.36, Iss.3, 2007-05, pp. : 179-192

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