The effects of the pressure and the oxygen content of the sputtering gas on the structure and the properties of zinc oxy-nitride thin films deposited by reactive sputtering of zinc

Author： Jiang Nanke   Georgiev Daniel G   Jayatissa Ahalapitiya H  

Publisher： IOP Publishing

ISSN： 0268-1242

Source： Semiconductor Science and Technology, Vol.28, Iss.2, 2013-02, pp. : 25009-25016

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