Bias voltage dependence properties of cadmium oxide films deposited by d.c. reactive magnetron sputtering

By Mohan Babu P.   Venkata Rao G.   Sreedhara Reddy P.   Uthanna S.  

Journal of Materials Science: Materials in Electronics, Vol. 15, Iss. 6, 2004-06 ,pp. : 389-394

Springer Publishing Company

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Copper nitride films deposited by dc reactive magnetron sputtering

By Venkata Subba Reddy K.   Sivasankar Reddy A.   Sreedhara Reddy P.   Uthanna S.  

Journal of Materials Science: Materials in Electronics, Vol. 18, Iss. 10, 2007-10 ,pp. : 1003-1008

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The influence of substrate temperature on the properties of aluminum-doped zinc oxide thin films deposited by DC magnetron sputtering

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Journal of Materials Science: Materials in Electronics, Vol. 17, Iss. 12, 2006-12 ,pp. : 973-977

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Microhardness of (Ti,Al)N films deposited by reactive R.F. magnetron sputtering

By Huang Chi-Tung   Duh Jenq-Gong  

Journal of Materials Science Letters, Vol. 16, Iss. 1, 1997-01 ,pp. : 59-61

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Nanocomposite Ti-Si-N films deposited by reactive unbalanced magnetron sputtering at room temperature

By Jiang N.   Shen Y.G.   Mai Y.-W.   Chan T.   Tung S.C.  

Materials Science and Engineering: B, Vol. 106, Iss. 2, 2004-01 ,pp. : 163-171

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