Kinetics of Hydrogenation and Variations in Resistance of Vanadium Thin Films Treated in Atomic Hydrogen Flow

Author： Kagadei V. A. Nefyodtsev E. V. Proskurovsky D. I. Romanenko S. V. Shevchenko N. A. Groetzschel R. Grambole D. Herrmann F. Ivanov Yu. F.

Publisher： Springer Publishing Company

ISSN： 1064-8887

Source： Russian Physics Journal, Vol.46, Iss.11, 2003-11, pp. : 1151-1159

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Atomic hydrogen adsorption on thin discontinuous and continuous gold films - Similarities and differences

By Stobiniski L. Nowakowski R. Dus R.

Vacuum, Vol. 48, Iss. 3, 1997-03 ,pp. : 203-207

Elsevier

Access to resources Recommend Favorite

Some issues on hydrogen and hydrogenation of plasma enhanced chemical vapor deposited films in a-Si:H thin-film transistors

By Kuo Y.

Vacuum, Vol. 59, Iss. 2, 2000-11 ,pp. : 484-491

Elsevier

Access to resources Recommend Favorite

Influence of atomic hydrogen on the growth kinetics of a-Si:H films and on the properties of silicon substrates

By Seitz H. Bauer S. Dusane R.O. Schroder B.

Thin Solid Films, Vol. 395, Iss. 1, 2001-09 ,pp. : 116-120

Elsevier

Access to resources Recommend Favorite

Growth kinetics and structure formation of ZrO 2 thin films in chloride-based atomic layer deposition process

By Aarik J. Aidla A. Mandar H. Uustare T. Sammelselg V.

Thin Solid Films, Vol. 408, Iss. 1, 2002-04 ,pp. : 97-103

Elsevier

Access to resources Recommend Favorite

Effects of hydrogen flow on properties of hydrogen doped ZnO thin films prepared by RF magnetron sputtering

By Hu Yuehui Chen Yichuan Chen Jun Chen Xinhua Ma Defu

Applied Physics A, Vol. 114, Iss. 3, 2014-03 ,pp. : 875-882

Springer Publishing Company

Access to resources Recommend Favorite