ANNEALING INDUCED DEGRADATION OF THERMAL SiO2 ON (1 0 0)Si: POINT DEFECT GENERATION

Author: STESMANS A.   PIERREUX D.   AFANAS'EV V. V.  

Publisher: Taylor & Francis Ltd

ISSN: 1042-0150

Source: Radiation Effects and Defects in Solids, Vol.158, Iss.1-6, 2003-01, pp. : 419-425

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Abstract