Post-Annealing Treatments and Interface Effects on Anomalous Magnetic Characteristics of HfOx Film

Author： Qiu X. Y.   Li J.   Chen P.   Zhang Y.   Tu Y. T.   Wang X. H.   Lu W.  

Publisher： Taylor & Francis Ltd

ISSN： 1058-4587

Source： Integrated Ferroelectrics, Vol.141, Iss.1, 2013-01, pp. : 145-153

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