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Taylor & Francis Ltd

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Etch Characteristics of Ferroelectric (Bi4−xLax)Ti3O12 Thin Films in an Inductively Coupled Plasma

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Embedded Memory Hierarchy Exploration Based on Magnetic Random Access Memory

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Bulk vertical micromachining of single-crystal sapphire using inductively coupled plasma etching for x-ray resonant cavities

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Online monitoring of the passivation breakthrough during deep reactive ion etching of silicon using optical plasma emission spectroscopy

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