Author: Xu Y. Guo Y. Wu Y. Xu R. Yan B. Lin W.
Publisher: Taylor & Francis Ltd
ISSN: 1569-3937
Source: Journal of Electromagnetic Waves and Applications, Vol.25, Iss.5-6, 2011-02, pp. : 819-832
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Trap states induced by reactive ion etching in AlGaN/GaN high-electron-mobility transistors
Chinese Physics B, Vol. 24, Iss. 11, 2015-11 ,pp. :