Highly robust electron beam lithography lift-off process using chemically amplified positive tone resist and PEDOT:PSS as a protective coating

Author: Kofler Johannes   Schmoltner Kerstin   Klug Andreas   List-Kratochvil Emil J W  

Publisher: IOP Publishing

ISSN: 0960-1317

Source: Journal of Micromechanics and Microengineering, Vol.24, Iss.9, 2014-09, pp. : 95010-95016

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