Double layer lift-off nanofabrication controlled gaps of nanoelectrodes with sub-100 nm by nanoimprint lithography

Author： Wang Shujie   Shi Qing   Chai Jing   Cheng Ke   Du Zuliang  

Publisher： IOP Publishing

E-ISSN： 1361-6528|26|18|185301-185308

ISSN： 0957-4484

Source： Nanotechnology, Vol.26, Iss.18, 2015-05, pp. : 185301-185308

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