Investigation of absolute atomic fluorine density in a capacitively coupled SF6/O2/Ar and SF6/Ar discharge

Author: Kechkar S   Babu S K   Swift P   Gaman C   Daniels S   Turner M  

Publisher: IOP Publishing

ISSN: 0963-0252

Source: Plasma Sources Science and Technology, Vol.23, Iss.6, 2014-12, pp. : 65029-65040

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