Modeling for V—O2 reactive sputtering process using a pulsed power supply

Author: Tao Wang   He Yu   Xiang Dong   Ya-Dong Jiang   Chao Chen   Ro-Land Wu  

Publisher: IOP Publishing

ISSN: 1674-1056

Source: Chinese Physics B, Vol.23, Iss.8, 2014-08, pp. : 88113-88120

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