Low‐temperature hollow cathode plasma‐assisted atomic layer deposition of crystalline III‐nitride thin films and nanostructures

Publisher： John Wiley & Sons Inc

E-ISSN： 1610-1642|12|4‐5|394-398

ISSN： 1862-6351

Source： PHYSICA STATUS SOLIDI (C) - CURRENT TOPICS IN SOLID STATE PHYSICS, Vol.12, Iss.4‐5, 2015-04, pp. : 394-398

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