A soft photo-mask with embedded carbon black and its application in contact photolithography

Author: Hsieh Yi-Ta   Hsieh Heng   Lee Yung-Chun  

Publisher: IOP Publishing

ISSN: 0960-1317

Source: Journal of Micromechanics and Microengineering, Vol.24, Iss.8, 2014-08, pp. : 85006-85010

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