Effect of oxidation treatments on the redistribution of the boron in the thin films of polycrystalline silicon Si-LPCVD used in VLSI

Author： Aït-Kaki A.   Rechem D.  

Publisher： Edp Sciences

E-ISSN： 1286-0050|25|2|77-84

ISSN： 1286-0042

Source： EPJ Applied Physics (The), Vol.25, Iss.2, 2004-01, pp. : 77-84

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