Growth of ultra-thin and highly relaxed SiGe layersunder in-situ introduction of point defects

Author: Lyutovich K.   Oehme M.   Ernst F.  

Publisher: Edp Sciences

E-ISSN: 1286-0050|27|1-3|341-344

ISSN: 1286-0042

Source: EPJ Applied Physics (The), Vol.27, Iss.1-3, 2010-03, pp. : 341-344

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Abstract