Publisher: Edp Sciences
E-ISSN: 1764-7177|05|C5|C5-953-C5-960
ISSN: 1155-4339
Source: Le Journal de Physique IV, Vol.05, Iss.C5, 1995-06, pp. : C5-953-C5-960
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Related content
In situ mass spetrometry during laser-induced chemical vapor deposition of silicon carbonitride
Le Journal de Physique IV, Vol. 09, Iss. PR8, 1999-09 ,pp. :
Laser induced chemical vapour deposition of TiN coatings at atmospheric pressure
Le Journal de Physique IV, Vol. 03, Iss. C3, 1993-08 ,pp. :
REMOTE PLASMA CHEMICAL VAPOUR DEPOSITION OF SILICON NITRIDE FILMS
Le Journal de Physique IV, Vol. 02, Iss. C2, 1991-09 ,pp. :