Metal-assisted chemical etching for very high aspect ratio grooves in n-type silicon wafers

Publisher: IOP Publishing

E-ISSN: 1361-6439|24|12|125026-125031

ISSN: 0960-1317

Source: Journal of Micromechanics and Microengineering, Vol.24, Iss.12, 2014-12, pp. : 125026-125031

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content