Control and optimization of the slope asymmetry effect in tailored voltage waveforms for capacitively coupled plasmas

Author： Bruneau B Novikova T Lafleur T Booth J P Johnson E V

E-ISSN： 1361-6595|24|1|15021-15030

ISSN： 0963-0252

Source： Plasma Sources Science and Technology, Vol.24, Iss.1, 2015-02, pp. : 15021-15030

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