Synthesis, Characterization, and Thermal Properties of Chlorine‐Containing 1,1,2,2‐Tetraaminodisilanes and Their Potential as Chemical Vapor Deposition Precursors for Silicon Nitride Films

Publisher: John Wiley & Sons Inc

E-ISSN: 1099-0682|2015|19|3205-3211

ISSN: 1434-1948

Source: EUROPEAN JOURNAL OF INORGANIC CHEMISTRY (ELECTRONIC), Vol.2015, Iss.19, 2015-07, pp. : 3205-3211

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