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Elsevier

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Synthesis and Characterization of Tungsten Nitrido Amido Guanidinato Complexes as Precursors for Chemical Vapor Deposition of WN_xC_y Thin Films

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John Wiley & Sons Inc

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Electrical properties of silicon nitride films grown on a SiGe layer by distributed electron cyclotron resonance plasma-enhanced chemical vapor deposition

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Effects of chlorine on tribological properties of TiN films prepared by pulsed d.c. plasma-enhanced chemical vapor deposition

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Effect of gas pressure on the synthesis of carbon nitride films during plasma-enhanced chemical vapor deposition

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