Development of an EUV Microscope with Focused Coherent EUV Based on Coherent Diffraction Imaging Method for Defect Evaluation on an EUV Mask

Publisher： John Wiley & Sons Inc

E-ISSN： 1520-6440|101|3|11-16

ISSN： 1942-9533

Source： ELECTRONICS & COMMUNICATIONS IN JAPAN, Vol.101, Iss.3, 2018-03, pp. : 11-16

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