Control of plasma equipment by regulating radio frequency impedance matching

Author: Kim B.   Park J.-H.   Kim B.S.  

Publisher: Elsevier

ISSN: 0167-9317

Source: Microelectronic Engineering, Vol.71, Iss.1, 2004-01, pp. : 7-14

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Related content