![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Author: Legros M.
Publisher: Taylor & Francis Ltd
ISSN: 1478-6443
Source: Philosophical Magazine, Vol.85, Iss.30, 2005-10, pp. : 3541-3552
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Characterization of pit morphology of sputtered Al-1wt.%Si-0.5wt.%Cu alloy thin film
By Pyun S.-I. Orr S.-J. Nam S.-W.
Thin Solid Films, Vol. 279, Iss. 1, 1996-06 ,pp. :
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
![](/images/ico/ico_close.png)
![](/images/ico/ico5.png)
Evaluation of HfN thin films considered as diffusion barriers in the Al/HfN/Si system
Thin Solid Films, Vol. 305, Iss. 1, 1997-08 ,pp. :