Microstructural study of iron nitride thin films deposited by ion beam sputtering

By Gupta M.   Gupta A.   Chaudhari S.M.   Phase D.M.   Ganesan V.   Rama Rao M.V.   Shripathi T.   Dasannacharya B.A.  

Vacuum, Vol. 60, Iss. 4, 2001-03 ,pp. : 395-399

Elsevier

Access to resources Recommend Favorite

Structures and properties of copper thin films prepared by ion beam assisted deposition

By Gotoh Y.   Yoshii H.   Amioka T.   Kameyama K.   Tsuji H.   Ishikawa J.  

Thin Solid Films, Vol. 288, Iss. 1, 1996-11 ,pp. : 300-308

Elsevier

Access to resources Recommend Favorite

Nanoscaled composite TiN/Cu multilayer thin films deposited by dual ion beam sputtering: growth and structural characterisation

By Abadias G.   Tse Y.Y.   Michel A.   Jaouen C.   Jaouen M.  

Thin Solid Films, Vol. 433, Iss. 1, 2003-06 ,pp. : 166-173

Elsevier

Access to resources Recommend Favorite

Characteristics of ion beam deposited copper thin films as a seed layer: effect of negative substrate bias voltage

By Lim J.-W.   Miyake K.   Isshiki M.  

Thin Solid Films, Vol. 434, Iss. 1, 2003-06 ,pp. : 34-39

Elsevier

Access to resources Recommend Favorite

Yttrium sesquioxide, Y 2 O 3 , thin films deposited on Si by ion beam sputtering: microstructure and dielectric properties

By Gaboriaud R.J.   Pailloux F.   Guerin P.   Paumier F.  

Thin Solid Films, Vol. 400, Iss. 1, 2001-12 ,pp. : 106-110

Elsevier

Access to resources Recommend Favorite