Structure and composition of (Ti, Al)N films prepared by r.f. planar magnetron sputtering using a composite target

By Inoue S.   Uchida H.   Koterazawa K.   Hioki A.   Howson R.P.  

Thin Solid Films, Vol. 271, Iss. 1, 1995-12 ,pp. : 15-18

Elsevier

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Process monitoring and control of low temperature reactively sputtered AlN

By Kirkpatrick S.R.   Rohde S.L.   Mihut D.M.   Kurruppu M.L.   Swanson III J.R.   Thomson D.   Woollam J.A.  

Thin Solid Films, Vol. 332, Iss. 1, 1998-11 ,pp. : 16-20

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Reactively DC magnetron sputtered thin AlN films studied by X-ray photoelectron spectroscopy and polarised infrared reflection

By Manova D.   Dimitrova V.   Karpuzov D.   Yankov R.  

Vacuum, Vol. 52, Iss. 3, 1999-03 ,pp. : 301-305

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Plasma substrate interaction effects on composition and chemical structure of reactively r.f. magnetron sputtered carbon nitride films 1

By Kaltofen R.   Sebald T.   Schulte J.   Weise G.  

Thin Solid Films, Vol. 347, Iss. 1, 1999-06 ,pp. : 31-38

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Modeling of reactively sputtered TiAlN films

By Lii D.-F.   Huang J.-L.   Shew B.-Y.  

Thin Solid Films, Vol. 335, Iss. 1, 1998-11 ,pp. : 122-126

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