In-situ measurement of gas-phase reactions during the metal-organic chemical vapor deposition of copper using Fourier-transform infrared spectroscopy

Author: Hanaoka K.   Tachibana K.   Ohnishi H.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.262, Iss.1, 1995-06, pp. : 209-217

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Abstract