W- and F-doped VO 2 films studied by photoelectron spectrometry

By Burkhardt W.   Christmann T.   Meyer B.K.   Niessner W.   Schalch D.   Scharmann A.  

Thin Solid Films, Vol. 345, Iss. 2, 1999-05 ,pp. : 229-235

Elsevier

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Reactively DC magnetron sputtered thin AlN films studied by X-ray photoelectron spectroscopy and polarised infrared reflection

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Vacuum, Vol. 52, Iss. 3, 1999-03 ,pp. : 301-305

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FeSi 2 thin films investigated by X-ray photoelectron and infrared spectroscopy

By Toneva A.   Goranova E.   Beshkov G.   Marinova T.   Kakanakova-Georgieva A.  

Vacuum, Vol. 58, Iss. 2, 2000-08 ,pp. : 420-427

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X-ray photoelectron spectroscopy characterization of amorphous molybdenum oxysulfide thin films

By Benoist L.   Gonbeau D.   Pfister-Guillouzo G.   Schmidt E.   Meunier G.   Levasseur A.  

Thin Solid Films, Vol. 258, Iss. 1, 1995-03 ,pp. : 110-114

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Cation valencies and distribution in the spinels Co x Cu y Mn z Fe u O 4+ ( =<0) thin films studied by X-ray photoelectron spectroscopy

By Gillot B.   Buguet S.   Kester E.   Baubet C.   Tailhades P.  

Thin Solid Films, Vol. 357, Iss. 2, 1999-12 ,pp. : 223-231

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