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Texture and grain structure in polycrystalline silver films deposited by partially ionised beam

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Effects of Cu seeding layer on Si grown by partially ionized beam in plasma enhanced chemical vapor deposition

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Thin Solid Films, Vol. 347, Iss. 1, 1999-06 ,pp. : 121-126

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Raman characteristics of hard carbon-nitride films deposited by reactive ionized cluster beam techniques

By Zou X.R.   Lu H.W.   Xie J.Q.   Feng J.Y.  

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Characteristics of Fe-N films deposited by a reactive ion beam sputtering using adsorptive and ionized nitrogen

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Vacuum, Vol. 66, Iss. 3, 2002-08 ,pp. : 251-256

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