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By Yoon S. F.   Ahn J.  

Philosophical Magazine B, Vol. 77, Iss. 1, 1998-01 ,pp. : 197-206

Taylor & Francis Ltd

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A possible method for large area deposition of a-Si:H thin films using electron cyclotron resonance plasma-enhanced chemical vapor deposition

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Deposition of polymeric nitrogenated amorphous carbon films (a-C:H:N) using electron cyclotron resonance CVD

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Investigation of radiation damage in N doped a-SiC:H films annealed by pulsed electron beam

By Huran J.   Hotovy I.   Hasck S.   Kobzev A.P.   Balalykin N.I.  

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Properties of a-SiC:H films deposited in high power regime

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