On the energy influx to the substrate during sputter deposition of thin aluminium films

By Kersten H.   Kroesen G.M.W.   Hippler R.  

Thin Solid Films, Vol. 332, Iss. 1, 1998-11 ,pp. : 282-289

Elsevier

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Optical properties of intrinsic and doped a-Si:H films grown by d.c. magnetron sputter deposition

By Rantzer A.   Arwin H.   Birch J.   Hjorvarsson B.   Bakker J.W.P.   Jarrendahl K.  

Thin Solid Films, Vol. 394, Iss. 1, 2001-08 ,pp. : 255-262

Elsevier

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A possible method for large area deposition of a-Si:H thin films using electron cyclotron resonance plasma-enhanced chemical vapor deposition

By Lee J.-H.   Park S.-K.   Shim C.-M.   Park S.   Jung D.-G.  

Thin Solid Films, Vol. 295, Iss. 1, 1997-02 ,pp. : 67-72

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Degradation during sputter deposition of solid electrolyte thin films for microsystems

By Seguin J.-L.   Lambert-Mauriat C.   Aguir K.   Bendahan M.   Jacolin C.   Lauque P.  

Thin Solid Films, Vol. 422, Iss. 1, 2002-12 ,pp. : 87-91

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Multilayer structures induced by plasma and laser beam treatments on a-Si:H and a-SiC:H thin films

By Mitu B.   Dinescu G.   Dinescu M.   Ferrari A.   Balucani M.   Lamedica G.   Dementjev A.P.   Maslakov K.I.  

Thin Solid Films, Vol. 383, Iss. 1, 2001-02 ,pp. : 230-234

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