Proposal for a new process flow for the fabrication of silicon-based complementary MOD-MOSFETs without ion implantation

Author: Augusto C.J.R.P.   De Meyer K.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.294, Iss.1, 1997-02, pp. : 254-258

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Abstract