Author: Kis-Sion K. Briand D. Mohammed-Brahim T. Sarret M. Lebihan F. Fortin B. Bonnaud O. Boher P. Stehle M. Stehle J.L.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.296, Iss.1, 1997-03, pp. : 53-56
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Residual stress in silicon films deposited by LPCVD from disilane
By Temple-Boyer P. Scheid E. Faugere G. Rousset B.
Thin Solid Films, Vol. 310, Iss. 1, 1997-11 ,pp. :
Microstructural and optical properties of as-deposited LPCVD silicon films
By Modreanu M. Tomozeiu N. Gartner M. Cosmin P.
Thin Solid Films, Vol. 383, Iss. 1, 2001-02 ,pp. :