X-ray reflectivity analysis of thin TiN and TiO x N y films deposited by dual-ion-beam sputtering on (100)Si substrates

Author: Alvisi M.   Rizzo A.   Tapfer L.   Vasanelli L.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.298, Iss.1, 1997-04, pp. : 130-134

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Abstract