Influence of reactive gas pressure on the deposition of an AlN protective film for organic photoconductor

Author: Miao X.S.   Chan Y.C.   Pun E.Y.B.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.315, Iss.1, 1998-03, pp. : 123-126

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Abstract