Relaxation of extrinsic and intrinsic stresses in germanium substrates with silicon films

Author： Wong P.Y.   Madras C.G.   Miaoulis I.N.   Goldman L.   Korenstein R.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.320, Iss.2, 1998-05, pp. : 260-263

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