Relaxation of extrinsic and intrinsic stresses in germanium substrates with silicon films

Author: Wong P.Y.   Madras C.G.   Miaoulis I.N.   Goldman L.   Korenstein R.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.320, Iss.2, 1998-05, pp. : 260-263

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract