Characterization of a PECVD W x N process using N 2 , H 2 , and WF 6

Author: Lai K.K.   Mak A.W.   Wendling T.P.H.F.   Jian P.   Hathcock B.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.332, Iss.1, 1998-11, pp. : 329-334

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content