XPS and AES characterization of SiN x :H layers deposited by PECVD on Parylene C. Effects of thermal treatments on Parylene C surfaces and Parylene C/SiN x :H interlayers

Author: Beche E.   Cros B.   Berjoan R.   Durand J.   Viard J.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.258, Iss.1, 1995-03, pp. : 143-150

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Abstract