On the nitrogen and oxygen incorporation in plasma-enhanced chemical vapor deposition (PECVD) SiO x N y films

By Alayo M.I.   Pereyra I.   Scopel W.L.   Fantini M.C.A.  

Thin Solid Films, Vol. 402, Iss. 1, 2002-01 ,pp. : 154-161

Elsevier

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Synthesis of SiO 2 and SiO x C y H z thin films by microwave plasma CVD

By Barranco A.   Cotrino J.   Yubero F.   Espinos J.P.   Bentez J.   Clerc C.   Gonzalez-Elipe A.R.  

Thin Solid Films, Vol. 401, Iss. 1, 2001-12 ,pp. : 150-158

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Optical and structural properties of low-temperature PECVD ETMS SiO x thin films

By Song Y.   Sakurai T.   Kishimoto K.   Maruta K.   Matsumoto S.   Kikuchi K.  

Thin Solid Films, Vol. 334, Iss. 1, 1998-12 ,pp. : 92-97

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Composition, structure and luminescent properties of Eu x Y 2-x SiO 5 thin films

By Liu Y.   Xu C.N.   Chen H.   Tateyama H.  

Thin Solid Films, Vol. 415, Iss. 1, 2002-08 ,pp. : 10-14

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Preparation of silicon oxynitride (SiO x N y ) thin films by pulsed laser deposition

By Xiao R.-F.   Ng L.C.   Jiang C.   Yang Z.Y.   Wong G.K.L.  

Thin Solid Films, Vol. 260, Iss. 1, 1995-05 ,pp. : 10-13

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