Effect of temperature and substrate on the growth behaviors of chemical vapor deposited Al films with dimethylethylamine alane source

Author： Woong Jang T.   Moon W.   Tae Baek J.   Tae Ahn B.  

Publisher： Elsevier

ISSN： 0040-6090

Source： Thin Solid Films, Vol.333, Iss.1, 1998-11, pp. : 137-141

Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.

Previous Menu Next

Abstract

Related content

Metal-organic chemical vapor deposition of aluminum from dimethylethylamine alane

By Rhee S.-W.   Yun J.-H.   Kim B.-Y.  

Thin Solid Films, Vol. 312, Iss. 1, 1998-01 ,pp. : 259-264

Elsevier

Access to resources Recommend Favorite

Effect of substrate temperature on the bonded states of indium tin oxide thin films deposited by plasma enhanced chemical vapor deposition

By Kim Y.-S.   Park Y.-C.   Ansari S.G.   Lee B.-S.   Shin H.-S.  

Thin Solid Films, Vol. 426, Iss. 1, 2003-02 ,pp. : 124-131

Elsevier

Access to resources Recommend Favorite

Investigation of the kinetics of the chemical vapor deposition of aluminum from dimethylethylamine alane: experiments and computations

By  

PHYSICA STATUS SOLIDI (C) - CURRENT TOPICS IN SOLID STATE PHYSICS, Vol. 12, Iss. 7, 2015-07 ,pp. : 923-930

John Wiley & Sons Inc

Access to resources Recommend Favorite

Low temperature atomic layer growth of aluminum nitride on Si(100) using dimethylethylamine alane and 1,1-dimethylhydrazine

By Robinson D.W.   Rogers Jr. J.W.  

Thin Solid Films, Vol. 372, Iss. 1, 2000-09 ,pp. : 10-24

Elsevier

Access to resources Recommend Favorite

Effect of substrate temperature on initiated plasma enhanced chemical vapor deposition of PHEMA thin films

By  

PHYSICA STATUS SOLIDI (C) - CURRENT TOPICS IN SOLID STATE PHYSICS, Vol. 12, Iss. 7, 2015-07 ,pp. : 1006-1010

John Wiley & Sons Inc

Access to resources Recommend Favorite