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Elsevier

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Properties of Cr(C,N) hard coatings deposited in Ar&unknown;C 2 H 2 &unknown;N 2 plasma

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Characterization of multilayer films of Ti&unknown;Al&unknown;O&unknown;C&unknown;N system prepared by pulsed d.c. plasma-enhanced chemical vapor deposition

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Optical absorption threshold of low pressure chemically vapor deposited silicon oxynitride films from SiCl 2 H 2 &unknown;NH 3 &unknown;N 2 O mixtures

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Formation of Fe&unknown;N films containing Fe 16 N 2 phase by ion beam assisted deposition

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