Correlation between the OES plasma composition and the diamond film properties during microwave PA-CVD with nitrogen addition

Author: Vandevelde T.   Wu T.D.   Quaeyhaegens C.   Vlekken J.   D'Olieslaeger M.   Stals L.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.340, Iss.1, 1999-02, pp. : 159-163

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Abstract