Electrical characterization of Ta 2 O 5 films deposited by laser reactive ablation of metallic Ta

Author: Fu Z.-W.   Chen L.-Y.   Qin Q.-Z.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.340, Iss.1, 1999-02, pp. : 164-168

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Abstract