An amorphous SiCOF film with low dielectric constant prepared by plasma-enhanced chemical vapor deposition

By Wang P.-F.   Ding S.-J.   Zhang D.W.   Wang J.-T.   Lee W.W.  

Thin Solid Films, Vol. 385, Iss. 1, 2001-04 ,pp. : 115-119

Elsevier

Access to resources Recommend Favorite

Properties of low dielectric constant fluorinated silicon oxide films prepared by plasma enhanced chemical vapor deposition

By Kim K.   Kwon D.   Lee G.S.  

Thin Solid Films, Vol. 332, Iss. 1, 1998-11 ,pp. : 369-374

Elsevier

Access to resources Recommend Favorite

Low dielectric constant plasma polymerized methyl-cyclohexane thin films deposited by inductively coupled plasma-enhanced chemical vapor deposition

By Jo H.   Quan Y.C.   Jung D.  

Thin Solid Films, Vol. 384, Iss. 1, 2001-03 ,pp. : 33-36

Elsevier

Access to resources Recommend Favorite

Study on the correlation between dielectric constant and chemical shift in FTIR spectra of SiOC film by chemical vapor deposition after annealing

By  

PHYSICA STATUS SOLIDI (C) - CURRENT TOPICS IN SOLID STATE PHYSICS, Vol. 7, Iss. 2, 2010-02 ,pp. : 448-451

John Wiley & Sons Inc

Access to resources Recommend Favorite

Formation and characterization of the fluorocarbonated-SiO 2 films by O 2 /FTES-helicon plasma chemical vapor deposition

By Oh K.S.   Kang M.S.   Lee K.-M.   Kim D.S.   Choi C.K.   Yun S.M.   Chang H.Y.   Kim K.H.  

Thin Solid Films, Vol. 345, Iss. 1, 1999-05 ,pp. : 45-49

Elsevier

Access to resources Recommend Favorite