Transmission electron microscopy study of silicon nitride amorphous films obtained by reactive pulsed laser deposition

By Teodorescu V.S.   Nistor L.C.   Popescu M.   Mihailescu I.N.   Gyorgy E.   Van Landuyt J.   Perrone A.  

Thin Solid Films, Vol. 397, Iss. 1, 2001-10 ,pp. : 12-16

Elsevier

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Electrical properties of silicon nitride films grown on a SiGe layer by distributed electron cyclotron resonance plasma-enhanced chemical vapor deposition

By Dufour-Gergam E.   Meyer F.   Delmotte F.   Hugon M.C.   Agius B.   Dutartre D.   Warren P.  

Thin Solid Films, Vol. 294, Iss. 1, 1997-02 ,pp. : 214-216

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Low temperature growth of silicon nitride by electron cyclotron resonance plasma enhanced chemical vapour deposition

By Flewitt A.J.   Dyson A.P.   Robertson J.   Milne W.I.  

Thin Solid Films, Vol. 383, Iss. 1, 2001-02 ,pp. : 172-177

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Effect of process parameters on the mechanical properties of carbon nitride thin films synthesized by plasma assisted pulsed laser deposition

By Tabbal M.   Mérel P.   Chaker M.  

Applied Physics A, Vol. 79, Iss. 4-6, 2004-09 ,pp. : 1365-1367

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Formation of high-quality silicon dioxide films by electron cyclotron resonance plasma oxidation and plasma-enhanced chemical vapour deposition

By Landheer D.   Hulse J.E.   Quance T.  

Thin Solid Films, Vol. 293, Iss. 1, 1997-01 ,pp. : 52-62

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