Optical characterization of hydrogenated amorphous carbon (a-C:H) thin films deposited from methane plasma

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Influence of the process parameters on the properties of hydrogenated amorphous carbon thin films deposited using ECR plasma

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Monitoring laser-induced microstructural changes of thin film hydrogenated amorphous carbon (a-C:H) using Raman spectroscopy

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Influence of the power and pressure on the growth rate and refractive index of a-C:H thin films deposited by r.f. plasma-enhanced chemical vapour deposition

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Some growth peculiarities of a-C:H films in ECR microwave plasma

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