Structural properties of amorphous carbon nitride films prepared by remote plasma-enhanced chemical vapor deposition

By Baik H.K.   Kim J.H.   Kim Y.H.   Choi D.J.  

Thin Solid Films, Vol. 289, Iss. 1, 1996-11 ,pp. : 79-83

Elsevier

Access to resources Recommend Favorite

Effects of chlorine on tribological properties of TiN films prepared by pulsed d.c. plasma-enhanced chemical vapor deposition

By Kawata K.   Sugimura H.   Takai O.  

Thin Solid Films, Vol. 407, Iss. 1, 2002-03 ,pp. : 38-44

Elsevier

Access to resources Recommend Favorite

The influence of hydrogen dilution ratio on the crystallization of hydrogenated amorphous silicon films prepared by plasma-enhanced chemical vapor deposition

By Kim H.-Y.   Lee K.-Y.   Lee J.-Y.  

Thin Solid Films, Vol. 302, Iss. 1, 1997-06 ,pp. : 17-24

Elsevier

Access to resources Recommend Favorite

Optical properties of silicon nanocrystallites in polycrystalline silicon films prepared at low temperature by plasma-enhanced chemical vapor deposition

By Milovzorov D.E.   Ali A.M.   Inokuma T.   Kurata Y.   Suzuki T.   Hasegawa S.  

Thin Solid Films, Vol. 382, Iss. 1, 2001-02 ,pp. : 47-55

Elsevier

Access to resources Recommend Favorite

Dependence of the properties of (Sr x Ti 1-x )O 3 thin films deposited by plasma-enhanced metal-organic chemical vapor deposition on electron cyclotron resonance plasma

By Lee J.S.   Song H.W.   Jun B.-H.   Kwack D.H.   Yu B.G.   Jiang Z.-T.   No K.  

Thin Solid Films, Vol. 301, Iss. 1, 1997-06 ,pp. : 154-161

Elsevier

Access to resources Recommend Favorite