Author: Aumaille K. Vallee C. Granier A. Goullet A. Gaboriau F. Turban G.
Publisher: Elsevier
ISSN: 0040-6090
Source: Thin Solid Films, Vol.359, Iss.2, 2000-01, pp. : 188-196
Disclaimer: Any content in publications that violate the sovereignty, the constitution or regulations of the PRC is not accepted or approved by CNPIEC.
Abstract
Related content
Physical properties of plasma deposited SiO x thin films
By San Andres E. del Prado A. Martil I. Gonzalez G. Martnez F.L. Bravo D. Lopez F.J. Fernandez M.
Vacuum, Vol. 67, Iss. 3, 2002-09 ,pp. :
Properties of a-Si 1-x C x :H thin films deposited from the organosilane Triethylsilane
Thin Solid Films, Vol. 352, Iss. 1, 1999-09 ,pp. :
Composition, structure and luminescent properties of Eu x Y 2-x SiO 5 thin films
By Liu Y. Xu C.N. Chen H. Tateyama H.
Thin Solid Films, Vol. 415, Iss. 1, 2002-08 ,pp. :