Effect of chemical sputtering on the growth and structural evolution of magnetron sputtered CN x thin films

By Hellgren N.   Johansson M.P.   Broitman E.   Sandstrom  

Thin Solid Films, Vol. 382, Iss. 1, 2001-02 ,pp. : 146-152

Elsevier

Access to resources Recommend Favorite

Tribological study of CN x films prepared by reactive d.c. magnetron sputtering

By Hajek V.   Rusnak K.   Vlcek J.   Martinu L.   Hawthorne H.M.  

Wear, Vol. 213, Iss. 1, 1997-12 ,pp. : 80-89

Elsevier

Access to resources Recommend Favorite

a-C(:H) and a-CN x (:H) films deposited by magnetron sputtering and PACVD

By Nobili L.   Cavallotti P.L.   Coccia Lecis G.   De Ponti G.   Lenardi C.  

Thin Solid Films, Vol. 317, Iss. 1, 1998-04 ,pp. : 359-362

Elsevier

Access to resources Recommend Favorite

Characterization of CN x films prepared by reactive magnetron sputtering

By Togashi Y.   Hirohata Y.   Hino T.  

Vacuum, Vol. 66, Iss. 3, 2002-08 ,pp. : 391-395

Elsevier

Access to resources Recommend Favorite

Microstructure of BN:C films deposited on Si substrates by reactive sputtering from a B 4 C target

By Johansson M.P.   Hultman L.   Daaud S.   Bewilogua K.   Luthje H.   Schutze A.   Kouptsidis S.   Theunissen G.S.A.M.  

Thin Solid Films, Vol. 287, Iss. 1, 1996-10 ,pp. : 193-201

Elsevier

Access to resources Recommend Favorite