Microstructure and semiconducting properties of c-BN films using r.f. plasma CVD thermally assisted by a tungsten filament

Author: Wang W.L.   Liao K.J.   Wang S.X.   Sun Y.W.  

Publisher: Elsevier

ISSN: 0040-6090

Source: Thin Solid Films, Vol.368, Iss.2, 2000-06, pp. : 283-286

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Abstract